The development and optimization of cleaning formulations and protocols require detailed insights into the interactions between cleaning agents, target soils, and surfaces under given conditions such as pH and temperature. Traditional analysis methods, which often focus on before-and-after assessments, lack the capability to provide time-resolved mechanistic information on the cleaning process. This limitation can obscure the path to achieving desired product performance. QSense® QCM-D technology addresses this challenge by offering time-resolved, nanoscale analysis of detergent activity and cleaning dynamics. It simultaneously provides detailed information on mass, thickness, and viscoelastic properties of soil layers at the sensor surface, enabling the study of molecular adsorption, desorption, and structural rearrangement. This method reveals crucial details about soil wetting, removal rates, surface etching, and soil re-deposition, facilitating a deeper understanding of the cleaning process. In this paper, we present three case examples demonstrating the application of QCM-D technology in assessing cleaning process dynamics, surface etching, and residual analysis. The results highlight how QCM-D can guide product design and development efficiently, reducing time and risk while ensuring optimal performance. By integrating QCM-D into the development workflow, formulators and chemists can make informed decisions, ultimately leading to superior cleaning products.
