1. Home
  2. »
  3. Product
  4. »
  5. Scattering Particle Analysis

Scattering Particle Analysis

Scattering Particle Analysis

Particle Detection Systems

Fastmicro provides high-speed surface particle measurement solutions according to ISO14644-9 and ISO14644-17 and other related high-purity standards for sub-micron technical cleanliness control. Discover the range of particle detection systems designed for surface particle inspection and particle deposition rate monitoring at sub-micron levels across a wide range of advanced manufacturing applications and accomplish breakthroughs in cleanliness control with fast, accurate and quantitative surface particle measurements.

Fast, Accurate Results

Gather particle data in seconds, not hours. Every scan detects and quantifies sub-micron particles with NIST-traceable calibration, enabling rapid identification of contamination sources.

Streamlined Industry Reporting

From measurement to reporting in a single workflow. Easily generate qualification reports to industry standards and tailor them with custom specifications.

Fastmicro Particle Detection Systems

Available configurations

Fastmicro systems enable you to make reliable decisions on where and how to improve cleanliness processes and deliver consistent product quality, improved manufacturing yield, enhanced equipment performance, and reduced product failures.

Indirect Particle Measurement

A compact inspection tool for indirect surface particle measurement. Using innovative surface sampling tape, it enables surface cleanliness verification with high repeatability across a wide variety of materials and surface geometries, including rough, curved, and hard-to-reach surfaces. In addition to sampling tape inspection, the tool also supports inspection of standard 2-inch silicon witness wafers for particle deposition monitoring and equipment qualification.

Particle Deposition Rate Monitoring

An industrialized compact scanner for continuous particle deposition rate monitoring to ISO 14644-17 standards. It measures particle fallout in real time on standard 2-inch silicon witness wafers, at intervals as short as 10 seconds, directly within the cleanroom or production environment.

Want to learn more? Talk to a scientist:

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.