Scattering Particle Analysis
Particle Fallout Scanner (PFS)
The Fastmicro Particle Fallout Scanner (PFS) has a compact, industrialized design and monitors particle deposition rate according to ISO 14644-17. The PFS enables process quality engineers to measure actual particle deposition in real time at critical areas, supporting process monitoring and contamination control within ambient cleanroom environments.
Continuous Monitoring
The PFS offers continuous particle fallout monitoring with measurement intervals as short as 10 seconds, enabling precise detection of contamination events in-situ
Hands-off Operation
The PFS auto-detects deposited particles and creates a time-stamped record of each detection throughout the monitoring period
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Real-time particle deposition monitoring where and when it matters
Effective contamination control and cleanliness validation require continuous monitoring at critical surfaces, not airborne particle measurements alone. Through a variety of mechanisms, airborne particles can deposit on critical surfaces, affecting technical cleanliness and product quality. The Particle Fallout Scanner delivers continuous fallout monitoring at short intervals of 10 seconds or more, with a large field of view across a 2-inch industry-standard silicon witness wafer. It supports continuous in-situ measurement on the system as well as batch-wise measurement of particle traps deployed in critical areas over a defined monitoring period.
Fastmicro Particle Fallout Scanner
Product Features
Continuous PDRL monitoring to ISO 14644-17
The Particle Fallout Scanner monitors particle deposition rate levels (PDRL) continuously, according to ISO 14644-17, with configurable measurement intervals as short as 10 seconds. Operator-friendly monitoring software helps process engineers track particle contamination trends in situ and address cleanliness process-control challenges in real time.
Automated warnings and qualification reporting
The particle detection software can warn users automatically when measurement output exceeds defined PDRL specifications. An optional qualification report can be generated directly from the user interface or exported as a PDF to support internal documentation and customer reporting. Data exchange is possible via USB or ethernet, with remote-access.
Non-destructive, re-measurable data
The measurement method is non-destructive and adds no contamination, allowing witness wafers to be transported, re-measured, and further analyzed. Data output includes particle count, location, size, time-stamp, together with annotated images with detection overlay, and export to KLARF and CSV formats.